The electronic structures of bis(tert-butylimino)bis(dimethylamino) tungsten and bis(N-ethylethanaminato)bis(N-methylmethanaminato) titanium heteroleptic complexes which are precursors for atomic layer deposition of metallic nitride on surfaces have been investigated by HeI and HeII UV photoelectron spectroscopy and DFT/OVGF calculations. We discuss the electronic structures of these two and other related d0 type complexes in relation to the mechanism of adsorption and decomposition of metal alkylamide precursors on surfaces.
Novak, I., Kovac, B., & Kovac, M. (2014). Electronic structure of two precursors for nanofabrication: [(CH3)3CN]2W[N(CH3)2]2 and Ti(NMe2)2(NEt2)2. Journal of Physical Chemistry A, 118(30), 5636-5641. https://doi.org/10.1021/jp505365n