Process Patterns: Reusable Design Artifacts for Business Process Models

Muhammad Ashad Kabir, Zhenchang Xing, Prakash Chandrasekaran, Shang Wei Lin

Research output: Book chapter/Published conference paperConference paper

1 Citation (Scopus)

Abstract

Graphical models for business processes are very large and cumbersome to build. Reusable process patterns can make this modeling task much easier. While using reusable components is a well-explored subject in software engineering, not much has been done in the context of business process modeling. In this paper, we will present an extension to Business Process Model and Notation (BPMN), the standard notation for modeling business processes, in the form of reusable Process Patterns. We introduce a type system for these patterns and use it to define a valid embedding of a process pattern in a larger model. We also introduce the formal notations and show that business processes modeled using our extended notation can be translated to BPMN. We present a case study to demonstrate the applicability of the process pattern and further quantify its characteristics using a set of criteria. We also implement a modeling tool for users to model business process using process patterns.
Original languageEnglish
Title of host publicationProceedings of the 2017 IEEE 41st Annual Computer Software and Applications Conference
Place of PublicationUnited States
PublisherIEEE, Institute of Electrical and Electronics Engineers
Pages714-721
Number of pages8
ISBN (Electronic)9781538603673
ISBN (Print)9781538603680
DOIs
Publication statusPublished - 11 Sep 2017
Event41st IEEE Computer Society International Conference on Computers, Software & Applications: COMPSAC 2017 - Politecnico di Torino, Turin, Italy
Duration: 04 Jul 201708 Jul 2017
https://www.computer.org/web/compsac2017 (Conference website)
https://ieeexplore.ieee.org/xpl/tocresult.jsp?isnumber=8029571 (Conference proceedings)

Conference

Conference41st IEEE Computer Society International Conference on Computers, Software & Applications
Abbreviated titleBuilding Digital Autonomy for a Sustainable World
CountryItaly
CityTurin
Period04/07/1708/07/17
OtherCOMPSAC is the IEEE Computer Society Signature Conference on Computers, Software, and Applications. It is a major international forum for academia, industry, and government to discuss research results and advancements, emerging problems, and future trends in computer and software technologies and applications. The technical program includes keynote addresses, research papers, industrial case studies, plenary and specialized panels, fast abstracts, a doctoral symposium, poster sessions, and a number of workshops and tutorials on emerging and important topics. The theme of the 41st COMPSAC is Building Digital Autonomy for a Sustainable World.

Our world changes constantly, driven by the desire to make our lives more convenient, safe and enjoyable. Once the lore of science-fiction, we now share our planet with billions of automated processes, functioning under the control of computer systems we have developed. As we enjoy the advantages they provide, we can’t help but wonder: what will be the next major technical innovations and where might they lead us? We’ve seen conventional automobiles become self-driving cars, human-directed systems become adapted ones, and human services enhanced by robotic services. Clearly, the movement from physical to cyber-enhanced domains is rapid and increasing, calling upon ever-more exciting innovations in computers, software, and applications.

COMPSAC 2017 will provide a forum for in-depth presentations and discussions of the technical challenges, successes, and failures of moving from traditional, person-centered and directed activities and services to those that are the focus of autonomous systems. Sessions will include topics and issues related to autonomous computing, wearable computing, the internet-of-things, social networking, cross-domain data fusion, privacy, security and surveillance, cloud computing, big data, physiological computing, self-aware and self-expressive systems, adaptive learning and teaching, and emerging architectures and network issues that affect all these developing technology-driven innovations.
Internet address

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  • Cite this

    Kabir, M. A., Xing, Z., Chandrasekaran, P., & Lin, S. W. (2017). Process Patterns: Reusable Design Artifacts for Business Process Models. In Proceedings of the 2017 IEEE 41st Annual Computer Software and Applications Conference (pp. 714-721). IEEE, Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/COMPSAC.2017.193